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Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing
Q2
Springer New York — United States (Northern America)
Active in Scopus
journal
0.585
SJR
89
H-Index
3.68
CiteScore
94
Total Dokumen
1,100
Sitasi 3 Tahun
54.1
Ref/Dokumen
#10,129
Rank Global
299
Dokumen 3 Tahun
Identitas
ISSN Print
0272-4324
ISSN Electronic
1572-8986
Cakupan Tahun
1981-2026
Scopus Source ID
13689
Bidang Subjek
Chemical Engineering
Chemistry
Materials Science
Physics and Astronomy
Kategori
Chemical Engineering (miscellaneous)
Chemistry (miscellaneous)
Condensed Matter Physics
Surfaces, Coatings and Films
Tautan
Website Jurnal
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Plasma Chemistry and Plasma Processing — Q2 SJR 0.585 | ScopusLens Publiora
